OBTAINING TITANIUM OXIDE THIN FILMS

Abstract

Dielectric thin films are mainly produced by high-frequency magnetron sputtering, electron beam sputtering, or gas-phase deposition of the corresponding material. Microelectronic devices, including sensors, are fabricated on insulating substrates or on passivated and insulating surfaces of the substrate. It has been shown that Ti thin films grown at 13.5 MHz and subsequently oxidized can provide substrates with the required resistance for hybrid circuits.