DEVELOPING A TECHNOLOGY FOR PRODUCING SIO2 BY RF MAGNETRON SPUTTERING

Abstract

It has been shown that when thin films of SiO₂ are grown on the surface of K8 glass at a frequency of 13.5 MHz, the reflection of light from the surface decreases. By develo­pi­n­g a technology for producing SiO₂ and TiO₂ layers and depositing them on the surfaces of opt­i­c­al glasses, it is possible to reduce reflection from optical surfaces and use them as a dielectric in the field of microelectronics.