STUDY OF ALLOWING ABILITY OF PHOTOLITHOGRAPHY IN THE TECHNOLOGY OF MANUFACTURING A MULTI-ELECTRODE PROBE

Abstract

At designing the technological sequence of manufacturing biopotential outputting multi-electrode silicon probe, to reduce the sizes of electrodes, the allowing ability of the photolithography process has been studied, depending on the refractive index of the layer between the photomask and photoresist and also different sine values of the spectral angle.